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This page is operated by the Surface Physics Group of UTEP.

For questions


contact Dr. Jorge A.


López (

  • Dr. Carlos Diaz Moreno (
  • Enrique Ramirez-Homs (
  • Equipment


    • PHI 5600 XPS X-ray photoelectron Spectrometer 
    • Orion 5 Thin film sputtering
    • X-MET 3000 Handheld X-Ray Fluorescence
    • MARKUS 10
    • Specifications of equipment
    • OmniFocus III small area lens 
    • Multi channel detector 
    • 10-360 spherical capacitor analyzer 
    • Includes monochromator and OMNI III lens and MCD detector and scanning AES option. 
    • XPS sensitivity: Magnesium anode specified performance obtained with single Mg anode operating at 400 W (26.7 mA and 15 kV) on a sample of clean silver. 
    • Analysis area: Selected by an externally fixed 1-position aperture and by a computer-controlled analyzer (150 um analysis area) 
    • Environmental requirements: 
    • Magnetic fields: less than 0.3 uT (3 mG) peak-to-peak, alternating field, less than 1G static field 
    • Heat dissipation: 3,000 W under typical operating conditions, 10,000 W additional during system breakout 
    • Utility requirements: 200-240 VAC, 1 phase, 50-60 Hz, 50 A (to be hardwired to separate 60 A branch circuit by customer) 
    • Dry nitrogen: 0.279 kg/cm^2 (4 psi) max 
    • Compressed air: 5.6 to 7.0 kg/cm^2 at 0.17 m^3/hr (80 to 100 psig at 0.1 CFM), pressure-regulated for vibration-isolated console and automatic valve control options only

    To be replaced

    PHI X-ray Photoelectron Spectroscopy systemImage Removed


    • Underground radon gas detector






    • Molecular dynamics


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